Active Mask Uv Lithography Systme for Mems and Μtas Applications

Terutake Hayashi, Takayuki Shibata, Takahiro Kawashima, Eiji Makino4,Takashi Mineta4, Toru Masuzawa5 1Department of Mechanical Engineering, Osaka University, Suita, Osaka, Japan 2 Department of Production Systems Engineering, Toyohashi University of Technology, Toyohashi, Japan 3Department of Electrical and Electronic Engineering, Toyohashi University of Toyohashi, Japan Department of Intelligent Machines and System Engineering, Hirosaki University, Hirosaki, Japan Department of Mechanical Engineering, Ibaraki University, Hitachi, Ibaraki, Japan